Improved blocking of self-assembled monolayers with intermittent air-water exposure

摘要

PROBLEM TO BE SOLVED: To improve the selectivity of subsequent material deposition by utilizing a self-assembled monolayer (SAM) as a mask material. A substrate 210 containing an exposed first material 216 and an exposed second material 218 is exposed to a self-assembled monolayer (SAM) molecule to selectively deposit SAM on the first material. Achieve. The substrate is exposed to the hydroxyl portion, and the exposure of the substrate to the SAM molecules and the exposure of the substrate to the hydroxyl portion are repeated at a time ratio of about 1: 1 to about 100: 1, respectively. After performing the iterations, the substrate is exposed to SAM molecules, a third material 280 is selectively deposited on the exposed second material, and the SAM is removed from the first material. [Selection diagram] FIG. 2C