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Improved blocking of self-assembled monolayers by intermittent air-water exposure
Improved blocking of self-assembled monolayers by intermittent air-water exposure
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机译:通过间歇性暴露于空气中,改善了对自组装单分子层的阻塞
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摘要
Implementations described herein generally relate to processes for the fabrication of semiconductor devices in which a self-assembled monolayer (SAM) is used to achieve selective area deposition. Methods described herein relate to alternating SAM molecule and hydroxyl moiety exposure operations which may be utilized to form SAM layers suitable for blocking deposition of subsequently deposited materials.
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