Inductively coupled plasma analysis system and inductively coupled plasma analysis method

摘要

PROBLEM TO BE SOLVED: To provide a sample supply device for inductively coupled plasma analysis capable of stably allowing a sample S to be analyzed to reach plasma. An inductively coupled plasma analysis system (10) for measuring a light emission state of a plasma (P) to which a sample to be measured is supplied, wherein light emission in a measurement area (MA) set in the plasma (P) is decomposed into a plurality of wavelength components (λk). The spectroscope 34, the detection device 36 for detecting the spatial distribution of the decomposed light, and the measuring device for measuring the detected spatial distribution at every measurement unit time Tu at least shorter than the time for the sample S to pass through the measurement area MA. 16 are provided. [Selection diagram] Figure 1