Dehydrogenation treatment apparatus, dehydrogenation treatment method, and laser annealing method

摘要

PROBLEM TO BE SOLVED: To provide a dehydrogenation treatment apparatus capable of shortening a tact time in manufacturing a TFT. A substrate to be processed in which a plurality of wirings are formed in parallel with each other and an amorphous silicon film is formed on the substrate and the wirings, A dehydrogenation treatment apparatus for performing dehydrogenation treatment for desorbing hydrogen, the dehydrogenation treatment furnace accommodating the substrate to be treated and heating the substrate at the dehydrogenation treatment temperature, and applying a current to the wiring. And a current generator that generates heat to heat the wiring. [Selection diagram] Figure 2