SUBSTRATE SUPPORT IN MILLISECOND ANNEAL SYSTEM

摘要

To provide a system and a method for substrate support in a millisecond anneal system.SOLUTION: A millisecond anneal system 80 includes a processing chamber 200 having a wafer support plate 214, a plurality of support pins 212 which extends from the wafer support plate. The support pins is configured so as to support a semiconductor substrate 60. At least one of the support pins has a spherical surface profile to adapt a varying angle of a substrate surface normal at a point of contact with the substrate.SELECTED DRAWING: Figure 4