Radio frequency (RF) sputter deposition source, deposition apparatus and method of assembling same

摘要

PROBLEM TO BE SOLVED: To provide a sputter deposition source for sputter deposition in a vacuum chamber, capable of providing improvement in stability of deposition conditions, more excellent in layer quality, reduction or prevention in target damage and/or reduction or prevention in arc generation.SOLUTION: A sputter deposition source 100 for sputter deposition comprises: the wall part 102 of a vacuum chamber; a target 20 supplying a material to be deposited during sputter deposition; an RF power supply for supplying RF electric power to the target; an electric power connector 124 for connecting the target to the RF power supply; and a conductor rod 110 extended through the wall part on the outer side of the vacuum chamber from the inner side of the vacuum chamber. The conductor rod 110 is connected to one or more components on the inner side of the vacuum chamber and is connected to the RF power supply on the outer side of the vacuum chamber, and a determined RF return path passing through the conductor rod 110 is formed.SELECTED DRAWING: Figure 1