MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND RESIST PATTERNING METHOD

摘要

To provide a negative resist composition that gives a resist film having very few defects while achieving high resolution and small LER, and polymers and patterning methods for use therein.SOLUTION: A polymer contains a repeating unit represented by formula (a) (where Ris a hydrogen atom or a methyl group. Rand Rindependently represent a hydrogen atom, or a C1-15 primary or secondary alkyl group, kis 0 or 1, kis an integer of 2-4).SELECTED DRAWING: None