首页> 外国专利> Methods of forming an array of capacitors, methods of forming an array of memory cells individually comprising a capacitor and a transistor, arrays of capacitors, and arrays of memory cells individually comprising a capacitor and a transistor

Methods of forming an array of capacitors, methods of forming an array of memory cells individually comprising a capacitor and a transistor, arrays of capacitors, and arrays of memory cells individually comprising a capacitor and a transistor

机译:形成电容器阵列的方法,形成分别包括电容器和晶体管的存储单元阵列的方法,电容器阵列以及分别包括电容器和晶体管的存储单元阵列

摘要

A method of forming an array of capacitors comprises forming elevationally-extending and longitudinally-elongated capacitor electrode lines over a substrate. Individual of the capacitor electrode lines are common to and a shared one of two capacitor electrodes of individual capacitors longitudinally along a line of capacitors being formed. A capacitor insulator is formed over a pair of laterally-opposing sides of and longitudinally along individual of the capacitor electrode lines. An elevationally-extending conductive line is formed over the capacitor insulator longitudinally along one of the laterally-opposing sides of the individual capacitor electrode lines. The conductive line is cut laterally through to form spaced individual other of the two capacitor electrodes of the individual capacitors. Other methods are disclosed, including structures independent of method of manufacture.
机译:一种形成电容器阵列的方法,包括在衬底上方形成高度延伸和纵向伸长的电容器电极线。各个电容器电极线沿形成的电容器线在纵向上分别与各个电容器的两个电容器电极共用并共享。电容器绝缘体形成在电容器电极线的各个的一对横向相对的侧面上并沿其纵向延伸。在电容器绝缘体上沿各个电容器电极线的横向相对侧之一纵向地形成有延伸的导线。导线被横向切开以形成间隔开的单个电容器的两个电容器电极中的另一个。公开了其他方法,包括独立于制造方法的结构。

著录项

  • 公开/公告号US10748987B2

    专利类型

  • 公开/公告日2020-08-18

    原文格式PDF

  • 申请/专利权人 MICRON TECHNOLOGY INC.;

    申请/专利号US201916426419

  • 发明设计人 DURAI VISHAK NIRMAL RAMASWAMY;

    申请日2019-05-30

  • 分类号H01L27/108;H01L49/02;H01L27/11507;H01L29/66;H01L29/78;

  • 国家 US

  • 入库时间 2022-08-21 11:31:06

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