首页> 外国专利> Composite substrate, method for forming nanocarbon film, and nanocarbon film

Composite substrate, method for forming nanocarbon film, and nanocarbon film

机译:复合基板,形成纳米碳膜的方法以及纳米碳膜

摘要

Provided is a composite substrate which is provided with: a single crystal silicon carbide thin film 11 having a thickness of 1μm or less; a handle substrate 12 which supports the single crystal silicon carbide thin film 11 and is formed from a heat-resistant material (excluding single crystal silicon carbide) having a heat resistance of not less than 1,100° C.; and an intervening layer 13 which has a thickness of 1μm or less and is arranged between the single crystal silicon carbide thin film 11 and the handle substrate 12, and which is formed from at least one material selected from among silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, zirconium oxide, silicon and silicon carbide, or from at least one metal material selected from among Ti, Au, Ag, Cu, Ni, Co, Fe, Cr, Zr, Mo, Ta and W. This composite substrate according to the present invention enables the formation of a nanocarbon film having few defects at low cost.
机译:提供一种复合基板,其具有:厚度为1μm以下的单晶碳化硅薄膜 11 ;和支撑单晶碳化硅薄膜 11 的手柄基板 12 ,该手柄基板由耐热性不大于1的耐热材料(单晶碳化硅除外)形成。低于1100℃;并且,在单晶碳化硅薄膜 11 与操作基板12之间配置有厚度为1μm以下的中间层 13 。选自氧化硅,氮化硅,氧化铝,氮化铝,氧化锆,硅和碳化硅中的至少一种材料,或选自Ti,Au,Ag,Cu,Ni,Co,Fe的至少一种金属材料Cr,Zr,Mo,Ta和W。根据本发明的这种复合衬底使得能够以低成本形成具有很少缺陷的纳米碳膜。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号