首页> 外国专利> Three-dimensional memory device having zigzag slit structures and method for forming the same

Three-dimensional memory device having zigzag slit structures and method for forming the same

机译:具有之字形缝隙结构的三维存储器件及其形成方法

摘要

Embodiments of 3D memory devices having zigzag slit structures and methods for forming the same are disclosed. In an example, a 3D memory device includes a substrate, a memory stack including interleaved conductive layers and dielectric layers above the substrate, an array of memory strings each extending vertically through the memory stack, and a plurality of slit structures laterally dividing the array of memory strings into a plurality of memory regions. Each of the plurality of slit structures extends vertically through the memory stack and extends laterally in a first zigzag pattern in a plan view.
机译:公开了具有锯齿形狭缝结构的3D存储器件的实施例及其形成方法。在一个示例中,3D存储器件包括衬底,包括在衬底上方的交错的导电层和介电层的存储堆叠,分别垂直延伸穿过该存储堆叠的存储串的阵列,以及横向地划分该存储阵列的多个狭缝结构。存储串分成多个存储区域。多个狭缝结构中的每一个在平面图中垂直地延伸穿过存储器堆叠并且以第一Z字形图案横向地延伸。

著录项

  • 公开/公告号US10680010B2

    专利类型

  • 公开/公告日2020-06-09

    原文格式PDF

  • 申请/专利权人 YANGTZE MEMORY TECHNOLOGIES CO. LTD.;

    申请/专利号US201816195835

  • 发明设计人 WENYU HUA;

    申请日2018-11-19

  • 分类号H01L27/11;H01L29/40;H01L21/31;H01L27/11582;H01L21/28;H01L21/311;H01L27/11565;H01L27/1157;

  • 国家 US

  • 入库时间 2022-08-21 11:26:27

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