首页>
外国专利>
POINT-OF-USE BLENDING OF RINSE SOLUTIONS TO MITIGATE PATTERN COLLAPSE
POINT-OF-USE BLENDING OF RINSE SOLUTIONS TO MITIGATE PATTERN COLLAPSE
展开▼
机译:使用点混合清洗溶液以减轻图案崩塌
展开▼
页面导航
摘要
著录项
相似文献
摘要
Embodiments provide point-of-use blending of photoresist rinse solutions for patterned photoresists. Disclosed methods and systems form different mitigation solutions for multiple different photoresists through point-of-use variable blending of a mitigation solution with deionized water and/or other chemistries to adjust the formulation of the solution just prior to dispense within a process chamber. For one example embodiment, different surfactant rinse solutions are used for different photoresists, such as different extreme ultraviolet photoresists. In addition, the level of reactive components, the level of nonreactive components, or both within a mitigation solution can be adjusted using this point-of-use blending to provide an adjusted mitigation solution. The ability to make point-of-use adjustments to the solution chemistry just before dispense on a microelectronic workpiece, such as a semiconductor wafer, improves interactions between the adjusted mitigation solution and the patterned photoresist.
展开▼