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THREE-DIMENSIONAL MEMORY DEVICE HAVING BONDING STRUCTURES CONNECTED TO BIT LINES AND METHODS OF MAKING THE SAME

机译:具有连接到位线的键合结构的三维存储器及其制造方法

摘要

Three-dimensional memory devices in the form of a memory die includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, and memory stack structures extending through the alternating stack, in which each of the memory stack structures includes a memory film and a vertical semiconductor channel contacting an inner sidewall of the memory film. Bit lines are electrically connected to an end portion of a respective one of the vertical semiconductor channels. Bump connection via structures contact a top surface of a respective one of the bit lines, in which each of the bump connection via structures has a greater lateral dimension along a lengthwise direction of the bit lines than along a widthwise direction of the bit lines. Metallic bump structures of another semiconductor die contact respective ones of the bump connection via structures to make respective electrical connections between the two dies.
机译:呈存储器裸片形式的三维存储器装置包括:绝缘层和位于衬底上方的导电层的交替堆叠;以及延伸穿过该交替堆叠的存储器堆叠结构,其中,每个存储器堆叠结构均包括存储器膜。垂直半导体沟道与存储膜的内侧壁接触。位线电连接到相应的垂直半导体通道之一的端部。凸块连接通孔结构接触相应的位线之一的顶表面,其中,每个凸块连接通孔结构沿位线的长度方向的横向尺寸大于沿位线的宽度方向的横向尺寸。另一个半导体管芯的金属凸块结构通过结构接触各个凸块连接,以在两个管芯之间进行相应的电连接。

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