首页> 外国专利> METHOD FOR FABRICATING A FERROELECTRIC MEMORY AND METHOD FOR CO-FABRICATION OF A FERROELECTRIC MEMORY AND OF A RESISTIVE MEMORY

METHOD FOR FABRICATING A FERROELECTRIC MEMORY AND METHOD FOR CO-FABRICATION OF A FERROELECTRIC MEMORY AND OF A RESISTIVE MEMORY

机译:铁电记忆体的制造方法以及铁电记忆体和电阻性记忆体的共同制造方法

摘要

A method of fabrication of a ferroelectric memory including a first electrode, a second electrode and a layer of active material made of hafnium dioxide HfO2 positioned between the first electrode and the second electrode, where the method includes depositing a first electrode layer; depositing the layer of active material; doping the layer of active material; depositing a second electrode layer; wherein the method includes sub-microsecond laser annealing of the layer of doped active material.
机译:一种铁电存储器的制造方法,其包括第一电极,第二电极以及由位于第一电极和第二电极之间的二氧化fHfO 2 制成的活性材料层,其中该方法包括沉积第一电极层;沉积活性材料层;掺杂活性材料层;沉积第二电极层;其中所述方法包括对掺杂的活性材料层的亚微秒激光退火。

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