首页> 外国专利> LATERAL CURRENT INJECTION ELECTRO-OPTICAL DEVICE WITH WELL-SEPARATED DOPED III-V LAYERS STRUCTURED AS PHOTONIC CRYSTALS

LATERAL CURRENT INJECTION ELECTRO-OPTICAL DEVICE WITH WELL-SEPARATED DOPED III-V LAYERS STRUCTURED AS PHOTONIC CRYSTALS

机译:具有隔离成光子晶体的掺杂III-V层的横向电流注入光电器件

摘要

A silicon photonic chip includes a silicon on insulator wafer and an electro-optical device on the silicon on insulator wafer. The electro-optical device is a lateral current injection electro-optical device that includes a slab having a pair of structured doped layers of III-V semiconductor materials arranged side-by-side in the slab, the pair of structured doped layers includes an n-doped layer and a p-doped layer, each of the p-doped layer and the n-doped layer is configured as a two-dimensional photonic crystal. A separation section extends between the pair of structured doped layers, the separation section fully separates the p-doped layer from the n-doped layer. The separation section includes current blocking trenches, and an active region of III-V semiconductor gain materials between the current blocking trenches that form a photonic crystal cavity.
机译:硅光子芯片包括绝缘体上硅晶片和绝缘体上硅晶片上的电光器件。该电光装置是横向电流注入电光装置,其包括平板,该平板具有在平板中并排布置的一对III-V族半导体材料的结构化掺杂层,该对结构化掺杂层包括n个。在p型掺杂层和p型掺杂层中,p型掺杂层和n型掺杂层中的每一个被配置为二维光子晶体。分离部在一对结构化掺杂层之间延伸,该分离部将p掺杂层与n掺杂层完全分离。分离部分包括电流阻挡沟槽,以及在电流阻挡沟槽之间的形成光子晶体腔的III-V半导体增益材料的有源区。

著录项

  • 公开/公告号US2020083673A1

    专利类型

  • 公开/公告日2020-03-12

    原文格式PDF

  • 申请/专利权人 INTERNATIONAL BUSINESS MACHINES CORPORATION;

    申请/专利号US201916572447

  • 发明设计人 CHARLES CAËR;LUKAS CZORNOMAZ;

    申请日2019-09-16

  • 分类号H01S5/343;H01S5/10;H01S5/024;H01S5/022;H01S5/30;H01S5/042;

  • 国家 US

  • 入库时间 2022-08-21 11:24:40

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