首页> 外国专利> Method for Modifying Substrates Based on Crystal Lattice Dislocation Density

Method for Modifying Substrates Based on Crystal Lattice Dislocation Density

机译:基于晶格位错密度的基板修饰方法

摘要

A method includes: providing a semiconductor body having a generation plane and crystal lattice planes which intersect the generation plane at intersecting lines; generating modifications in the semiconductor body by multiphoton excitation and which are spaced apart from one another, the modifications altering a physical property of the semiconductor body so as to form subcritical cracks in the generation plane; and separating a solid-state layer from the semiconductor body by connecting the subcritical cracks in the generation plane.
机译:一种方法,包括:提供半导体本体,该半导体本体具有生成平面和在相交线上与生成平面相交的晶格平面;通过多光子激发在半导体本体中产生并且彼此间隔开的变型,这些变型改变半导体本体的物理性质,从而在产生平面中形成亚临界裂纹。通过在产生平面中连接亚临界裂纹,将固态层与半导体本体分离。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号