METHOD FOR POLISHING GLASS SUBSTRATE, METHOD FOR MANUFACTURING GLASS SUBSTRATE, METHOD FOR MANUFACTURING MAGNETIC-DISK GLASS SUBSTRATE, METHOD FOR MANUFACTURING MAGNETIC DISK, POLISHING LIQUID, AND METHOD FOR REDUCING CERIUM OXIDE

摘要

A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.