首页> 外国专利> SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEGRATED SEMICONDUCTOR PROCESSING MODULES AND METHOD FOR USING SAME

SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEGRATED SEMICONDUCTOR PROCESSING MODULES AND METHOD FOR USING SAME

机译:集成了集成半导体处理模块的自觉和校正异质平台及其使用方法

摘要

This disclosure relates to a high volume manufacturing system for processing and measuring workpieces in a semiconductor processing sequence without leaving the system's controlled environment (e.g., sub-atmospheric pressure). The systems process chambers are connected to each other via transfer chambers used to move the workpieces, in the controlled environment, between the process chambers. The transfer chambers include a measurement region with dedicated workpiece support chucks capable of translating and/or rotating the workpiece during the measurement.
机译:本公开涉及一种用于在不离开系统的受控环境(例如,低于大气压)的情况下以半导体处理顺序处理和测量工件的大批量制造系统。系统处理腔室之间通过传送腔室相互连接,该传送腔室用于在受控环境中在处理腔室之间移动工件。传送室包括一个带有专用工件支撑卡盘的测量区域,该卡盘能够在测量过程中平移和/或旋转工件。

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