首页> 外国专利> SUPER-JUNCTION POWER VDMOS HAVING EXTREMELY LOW REVERSE RECOVERY CHARGE

SUPER-JUNCTION POWER VDMOS HAVING EXTREMELY LOW REVERSE RECOVERY CHARGE

机译:超结电源VDMOS具有极低的反向恢复电荷

摘要

The present invention relates to a super-junction power VDMOS having an extremely low reverse recovery charge, comprising an N-type substrate also serving as a drain and an N-type drift region. A first P column is provided in the N-type drift region; a first P-type body region is provided in the top of the first P column; an NMOS is provided in the first P-type body region; a SiO2 isolation layer is provided between the NMOS and the first P-type body region; and a first P-type heavily doped region is provided in the first P-type body region. Source metal of a super-junction VDMOS, source metal of the NMOS, and the first P-type heavily doped region are connected; the drain of the super-junction VDMOS serves as the drain of the super-junction power VDMOS; the gate of the super-junction VDMOS and the gate of the NMOS are connected and serve as the gate of the super-junction power VDMOS; the drain of the NMOS serves as the source of the super-junction power VDMOS; and an N-type drift region of the super-junction VDMOS is provided with a Schottky contact which is connected to the drain of the NMOS, so as to form a Schottky diode of which the cathode and anode are respectively connected to the drain and source in the structure provided by the present invention.
机译:具有超低反向恢复电荷的超结功率VDMOS技术领域本发明涉及具有极低的反向恢复电荷的超结功率VDMOS,其包括还用作漏极的N型衬底和N型漂移区。在N型漂移区域中设置有第一P列。在第一P列的顶部设置第一P型主体区域。 NMOS设置在第一P型体区中;在NMOS和第一P型体区之间设置有SiO2隔离层。在第一P型体区中设置有第一P型重掺杂区。连接超结VDMOS的源极金属,NMOS的源极金属和第一P型重掺杂区域。超结VDMOS的漏极用作超结功率VDMOS的漏极。超结VDMOS的栅极与NMOS的栅极相连,并作为超结功率VDMOS的栅极。 NMOS的漏极用作超结电源VDMOS的源极。超结VDMOS的N型漂移区具有与NMOS的漏极连接的肖特基接触,以形成其阴极和阳极分别与漏极和源极连接的肖特基二极管在本发明提供的结构中。

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