APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION (ALD)

摘要

The invention relates to an apparatus (1) and a method for processing one or more substrates in a batch process according to the principles of atomic layer deposition (ALD). The apparatus (1) comprises a reaction chamber (2), a chamber plate (3) for closing the reaction chamber (2), a motor (9) arranged to move the chamber plate (3) between an open position, in which the reaction chamber (2) is open, and a closed position, in which the reaction chamber (2) is closed, and an actuator arm mechanism (5) connected to said motor (9). The actuator arm mechanism (5) having three or more actuator arms (5a, 5b, 5c) having a distal end, which is connected to the chamber plate (3), the distal ends of the three or more actuator arms (5a, 5b, 5c) define a plane on the chamber plate (3).