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INTERMITTENT ELECTRICITY APPLICATION TYPE VERTICAL PLATING DEVICE

机译:间歇式电力应用型立式设备

摘要

The present invention relates to a vertical plating device and, specifically, to an intermittent electricity application type vertical plating device enabling a substrate to be plated well while stably and smoothly moving a substrate. According to the present invention, the intermittent electricity application type vertical plating device comprises: a plating tank for plating the substrate; a rail member arranged in the upper part of the plating tank; a hanger moving along the rail member; an upper clamp connected to the hanger and holding an upper part of the substrate; and a power applying member applying power to the substrate by being in contact with the substrate which is held by the upper clamp. The power applying member intermittently applies the power to the substrate by being selectively in contact with the substrate.;COPYRIGHT KIPO 2020
机译:垂直镀覆装置技术领域本发明涉及一种垂直镀覆装置,尤其涉及一种间歇通电方式的垂直镀覆装置,其能够在稳定且平稳地移动基板的同时良好地镀覆基板。根据本发明,间断通电型立式电镀装置包括:用于对基板进行电镀的电镀槽;以及用于对基板进行电镀的电镀槽。在镀槽的上部配置有轨道部件。沿轨道构件移动的衣架;上夹具连接到悬挂器并保持基板的上部。动力施加部件通过与被上夹具保持的基板接触而向基板施加动力。动力施加构件通过选择性地与基板接触而间歇地将动力施加到基板。; COPYRIGHT KIPO 2020

著录项

  • 公开/公告号KR20200043663A

    专利类型

  • 公开/公告日2020-04-28

    原文格式PDF

  • 申请/专利权人 NEOPMC CO. LTD.;BAE MIN SU;

    申请/专利号KR20180124288

  • 发明设计人 BAE MIN SUKR;

    申请日2018-10-18

  • 分类号C25D17;C25D17/06;H05K3/18;

  • 国家 KR

  • 入库时间 2022-08-21 11:07:17

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