首页> 外国专利> HARD CHROME PLATING METHOD FOR VERTICAL TYPE AND HARD CHROME PLATING DEVICE

HARD CHROME PLATING METHOD FOR VERTICAL TYPE AND HARD CHROME PLATING DEVICE

机译:立式硬铬镀覆方法及硬铬镀覆装置

摘要

PROBLEM TO BE SOLVED: To make it possible to apply plating of a uniform and precise thickness, to eliminate the need for a precision polishing stage for making the thickness of plating uniform, to drastically reduce the time before completion of products and to drastically reduce a production cost.;SOLUTION: A plating tank 1 into which a long-sized member to be plated is perpendicularly immersed in disposed and a supporting stand 2 is mounted above the plating tank 1. A connecting body 3 of conductive material freely attachably and detachably connected to the top end of the member to be plated and a revolving shaft 4 of conductive material which is connected to the upper part of the connecting body 3 and energizes and supports the member to be plated are freely rotatably supported at the supporting stand 2. A plurality of carbon terminals 6 are brought into pressurized contact with a disk-shaped conductive plate 5 fixed to the top end of the revolving shaft 4 to energize the member to be plated in the plating tank while rotating.;COPYRIGHT: (C)2000,JPO
机译:要解决的问题:为了能够进行均匀且精确的厚度镀层,消除了用于使镀层厚度均匀的精密抛光阶段的需要,大大减少了产品完成之前的时间,并大大减少了镀层的厚度。生产成本:解决方案:电镀槽1中垂直放置有电镀的长尺寸部件,电镀槽1上方安装有支撑架2。导电材料的连接体3可自由装卸。在支撑台2上自由旋转自如地支撑着被镀部件的顶端和连接至连接体3的上部并向被镀部件提供能量并对其进行支撑的导电材料的旋转轴4。多个碳端子6与固定在旋转轴4的顶端上的盘状导电板5加压接触,从而使部件通电。旋转时可在电镀槽中电镀。版权所有:(C)2000,日本特许厅

著录项

  • 公开/公告号JP2000355794A

    专利类型

  • 公开/公告日2000-12-26

    原文格式PDF

  • 申请/专利权人 FUKKA CHROM:KK;

    申请/专利号JP19990166489

  • 发明设计人 SHIBAZAKI SABURO;

    申请日1999-06-14

  • 分类号C25D7/04;

  • 国家 JP

  • 入库时间 2022-08-22 01:26:37

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