首页> 外国专利> CRUCIBLE FOR SINGLE CRYSTAL GROWTH AND SILICON CARBIDE SINGLE CRYSTAL GROWTH APPARATUS INCLUDING SAME

CRUCIBLE FOR SINGLE CRYSTAL GROWTH AND SILICON CARBIDE SINGLE CRYSTAL GROWTH APPARATUS INCLUDING SAME

机译:单晶生长和碳化硅的单晶生长装置(包括相同)的坩埚

摘要

The present invention relates to a crucible having an inner space unit formed to charge molten metal containing silicon carbide (SiC) or silicon by being provided in a reaction chamber under a constant pressure atmosphere. According to the present invention, the crucible has an inner circumferential surface formed in a concave-convex shape that a concave portion and a convex portion repeat on the basis of the cross-section, and the concave portion and the convex portion are formed to have a constant length in a vertical direction.;COPYRIGHT KIPO 2020
机译:坩埚技术领域本发明涉及一种坩埚,其具有内部空间单元,该内部空间单元被形成为通过在恒定压力气氛下设置在反应室中而对包含碳化硅(SiC)或硅的熔融金属进行充电。根据本发明,所述坩埚具有形成为凹凸形状的内周面,所述凹凸形状基于所述横截面重复凹入部分和凸出部分,并且所述凹入部分和所述凸出部分形成为具有在垂直方向上的恒定长度。COPYRIGHTKIPO 2020

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