Pellicle of extreme ultraviolet lithography and method of fabricating the same

摘要

The present invention relates to a pellicle for extreme ultraviolet lithography and to a production method thereof. The pellicle for extreme ultraviolet lithography comprises: a pellicle film having a predetermined thickness; a frame formed on an edge region of the pellicle film to support the pellicle film; and a boron injection film disposed between the pellicle film and the frame, wherein the boron injection film is formed to be spaced a predetermined distance inward from the outer circumference of the pellicle film.