METHOD FOR PRODUCING STEP-AND-REPEAT VAPOR DEPOSITION MASK STEP-AND-REPEAT VAPOR DEPOSITION MASK OBTAINED THEREFROM AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT

摘要

It provides a method of manufacturing a step-and-repeat deposition mask capable of satisfying both high precision and light weight even in the case of large-sized. Each of the plurality of masks disposed in the opening space in the frame is constituted by a metal mask on which a slit is formed, and a resin mask on the surface of the metal mask, and in which multiple openings corresponding to a pattern to be deposited are arranged horizontally and vertically, In the formation, after attaching the metal film and the resin film material for creating the resin mask to the frame, the resin film material is processed to open and close the plurality of openings corresponding to the pattern to be deposited. By heat-forming, a step-and-repeat deposition mask having the above-described configuration is produced.