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PVD APPARATUS AND METHOD FOR CONTROLLING COATING LAYER IN PVD PLATING PROCESSS

机译:PVD镀覆过程中的PVD设备和控制镀层的方法

摘要

The present invention provides a plating layer control device in a PVD plating process that forms a plating layer by physical vapor deposition (PVD) of a steel sheet with metal vapor. The plating layer control apparatus includes a crucible to which a molten material is introduced; An electromagnetic induction coil disposed around the outer side of the crucible to heat the molten material introduced into the crucible and form a molten metal to generate metal vapor from the molten metal; A power supply unit that supplies current to the electromagnetic induction coil; And a control unit that measures the impedance of the electromagnetic induction coil and controls the current supplied to the electromagnetic induction coil so that the impedance is kept constant according to the dissolved material input to the crucible at a constant supply speed.
机译:本发明提供一种PVD镀覆工艺中的镀层控制装置,其通过利用金属蒸气对钢板进行物理气相沉积(PVD)来形成镀层。镀层控制装置包括向其引入熔融材料的坩埚;和电磁感应线圈设置在坩埚的外侧,以加热引入坩埚的熔融材料并形成熔融金属以从熔融金属中产生金属蒸气。电源单元,向电磁感应线圈供电。控制单元测量电磁感应线圈的阻抗并控制供应给电磁感应线圈的电流,以便根据以恒定的供应速度输入到坩埚的溶解材料将阻抗保持恒定。

著录项

  • 公开/公告号KR20200076389A

    专利类型

  • 公开/公告日2020-06-29

    原文格式PDF

  • 申请/专利权人 주식회사 포스코;

    申请/专利号KR20180165450

  • 申请日2018-12-19

  • 分类号C23C14/54;C23C14/24;C23C14/26;G01R27/26;H05B6/06;

  • 国家 KR

  • 入库时间 2022-08-21 11:06:38

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