首页> 外国专利> 193 193 LASER AND INSPECTION SYSTEM

193 193 LASER AND INSPECTION SYSTEM

机译:193 193激光和检查系统

摘要

An improved solid state laser is described that generates light of less than 200 nm. These lasers generate less than 200 nm of light using a fundamental wavelength between about 1030 nm and about 1065 nm. The final frequency conversion stage of the laser combines light at a wavelength of approximately 1109 nm with light at a wavelength of approximately 234 nm to produce a wavelength of 200 nm or less. By properly selecting the nonlinear medium, such mixing can be achieved by almost non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.
机译:描述了一种改进的固态激光器,其产生小于200nm的光。这些激光器使用介于约1030nm和约1065nm之间的基本波长产生少于200nm的光。激光器的最终频率转换级将波长约为1109 nm的光与波长约为234 nm的光组合在一起,以产生200 nm以下的波长。通过适当地选择非线性介质,可以通过几乎非关键的相位匹配来实现这种混合。这种混合导致高转换效率,良好的稳定性和高可靠性。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号