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首页> 外文期刊>Applied Physics. A, Materials Science & Processing >Properties of a Co/Cu/Co spin-valve system prepared by an optimized 193 nm pulsed laser deposition process
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Properties of a Co/Cu/Co spin-valve system prepared by an optimized 193 nm pulsed laser deposition process

机译:通过优化的193 nm脉冲激光沉积工艺制备的Co / Cu / Co自旋阀系统的性能

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摘要

Layered CoO/Co(7 nm)/Cu(6 nm)/Co(7 nm) spin-valve systems capped by a 5 nm boron top layer, which exhibit giant magnetoresistance (GMR), were prepared by pulsed laser deposition (PLD) with a 193 nm ArF excimer laser. To reduce atomic intermixing at the various layer interfaces, the areal energy density of the laser was lowered to 4.2 J/cm~2 for the first 2 nm of the intermediate Cu and the Co top layers, while applying 11 J/cm~2 for the rest. By this procedure, a clear improvement of the GMR could be accomplished as compared to an identical reference system prepared by exclusively applying the high value of 11 J/cm~2, pointing to the importance of minimizing interface mixing. Additionally, the effect of the laser intensity on the areal density and shape of μm-sized droplets co-deposited onto the substrates by PLD was studied. It turned out that for the two limiting values applied in the present case, no negative influence of the droplets on the magnetic hysteresis of pure Co layers or spin-valve systems could be observed.
机译:通过脉冲激光沉积(PLD)制备了层状CoO / Co(7 nm)/ Cu(6 nm)/ Co(7 nm)被5 nm硼顶层覆盖并表现出巨磁阻(GMR)的自旋阀系统用193 nm ArF准分子激光器。为了减少原子在各个层界面处的混合,对于中间Cu和Co顶层的前2 nm,激光的面能量密度降低到4.2 J / cm〜2,而对11 Cu / cm〜2施加11 J / cm〜2。其余的部分。通过该程序,与通过单独应用11 J / cm〜2的高值制备的相同参考系统相比,可以实现GMR的明显改善,指出了最小化界面混合的重要性。此外,研究了激光强度对通过PLD共沉积在基板上的μm大小的液滴的面密度和形状的影响。结果表明,对于在当前情况下应用的两个极限值,没有观察到液滴对纯Co层或自旋阀系统的磁滞的负面影响。

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