OVERLAY ERROR PREDICTION METHOD AND OVERLAY ERROR CORRECTION METHOD FOR SEMICONDUCTOR DEVICE

摘要

The overlay error prediction method and overlay error correction method of a semiconductor device according to the present invention first use a wafer-level overlay error modeling method that corrects with one overlay error model using all overlay errors in the wafer and overlay errors belonging to each field. A field-level overlay error modeling method is performed to establish an overlay error model for each field. Thereafter, the regression coefficients derived from the wafer level overlay error modeling method and the field level overlay error modeling method are averaged to finally obtain the overlay error modeling method according to the present invention. Accordingly, since the present invention can simultaneously reflect the tendency of the overall overlay error in the wafer and the tendency of the overlay error in each field, it is possible to perform more optimized correction for a wafer in which the overlay error is not measured. In particular, in the case of the present invention, about 15.9% is improved compared to the linear least squares regression (OLS-based) model in terms of mean square error (MSE) through the experimental example, and in terms of mean absolute error (MAE) and |mean|+3σ It was confirmed that 8.3% and 7.8% were improved, respectively, and it was confirmed that there is an effect of minimizing the deformation between wafers in the lot.