PHASE SHIFT MASK BLANK AND MANUFACTURING METHOD THEREFOR PHASE SHIFT MASK AND MANUFACTURING METHOD THEREFOR AND DISPLAY DEVICE MANUFACTURING METHOD

摘要

The present invention provides a phase shift mask blank that can be formed into a cross-sectional shape that effectively manifests a phase effect by wet etching. A transparent substrate, a light semitransmissive film comprising a metal silicide-based material formed on a main surface of the transparent substrate, and an etching mask film comprising a chromium-based material formed on the light semitransmissive film, the light semitransmissive film and etching A composition inclined region P is formed at the interface of the mask film, and in the composition inclined region P, the proportion of components that slow down the wet etching rate of the light semitransmissive film is gradually and / or continuously increasing toward the depth direction.