The additive for abrasive slurries according to the present invention and the slurry composition comprising the same can reduce the amount of dishing when applied to polishing or planarization of an oxide film. More specifically, the additive for the polishing slurry includes a polyacrylic acid-based anti-freezing agent and a glycol-based complex forming agent, and the slurry composition forms a polishing liquid containing abrasive particles and a dispersing agent and a polyacrylic-acid-based anti-freezing agent and a glycol-based complex. By including the additive for the polishing slurry containing the agent, since the polyacrylic acid-glycol-based composite can reduce the dishing phenomenon, it is possible to improve the performance of the device in the ultrafine device.
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