EXHAUST GAS PROCESSING APPARATUS USING HIGH ENERGY THERMAL PLASMA AND HIGH TEMPERATURE CHAMBER TO PROCESS PERFLUORINATED COMPOUND GAS AT HIGH EFFICIENCY

摘要

The present invention relates to an exhaust gas processing apparatus to increase processing efficiency of perfluorinated compound (PFC) gas with difficulty in processing. More specifically, the exhaust gas processing apparatus using a high energy thermal plasma and a high temperature chamber to process the PFC gas at high efficiency completely decomposes an exhaust gas, which is received by additionally supplying a reaction gas (steam, CDA, air, and the like) when a high-energy thermal plasma is generated by using DC power into an electron, a proton, and a nucleus to process the exhaust gas into a harmless gas state and discharge the processed exhaust gas after being secondarily maintained in the high temperature chamber at high temperature for a long time, thereby realizing a low-power high-efficiency exhaust gas treatment process capable of preventing recombination during a discharge process, processing a water-soluble gas, and decreasing temperature. In addition, the exhaust gas processing apparatus improves performance of the high energy thermal plasma due to energy amplification of the same, and realizes efficient treatment since the discharged decomposed gas is filtered and dehumidified one more time. According to the present invention, the apparatus comprises a plasma generation unit, the high temperature chamber, a water tank, and a gas discharge pipe.;COPYRIGHT KIPO 2020