首页> 外国专利> Side wall nozzle unit for wafer seating cassette of side storage and wafer seating cassette of side storage comprising the side wall nozzle unit for wafer seating cassette of side storage

Side wall nozzle unit for wafer seating cassette of side storage and wafer seating cassette of side storage comprising the side wall nozzle unit for wafer seating cassette of side storage

机译:用于侧面存储器的晶片容纳盒的侧壁喷嘴单元和用于侧面存储器的晶片容纳盒,包括用于侧面存储器的晶片容纳盒的侧壁喷嘴单元

摘要

Since the side nozzle unit for a wafer storage cassette of the disclosed side storage includes a side nozzle body, a side nozzle side gas supply pipe and a plurality of side nozzles, gas is supplied through a side nozzle unit for the wafer storage cassette of the side storage. And as it flows as it diffuses through the gas diffusion hole in a range from an extension line at the rear side of the gas diffusion hole to an opening portion for each wafer entry and exit of the wafer storage cassette of the side storage, at the opening portion of the wafer storage cassette of the side storage. There is an advantage in that vortex formation is suppressed, and thus the phenomenon that fume flows back through the opening portion of the wafer receiving cassette of the side storage by the vortex can be prevented.
机译:由于所公开的侧部收纳库的晶片收纳盒用侧喷嘴单元具有侧喷嘴主体,侧喷嘴侧气体供给管和多个侧喷嘴,因此,通过侧方的用于晶片收纳盒的侧喷嘴单元来供给气体。侧面存储。并且,随着气体的扩散通过气体扩散孔,该气体在从气体扩散孔的后侧的延长线到侧面储存器的晶片收纳盒的每个晶片进入和离开的开口部的范围内扩散。侧面储存器的晶片储存盒的开口部分。其优点在于,抑制了涡流的形成,因此可以防止烟气通过涡流流经侧储藏室的晶片容纳盒的开口部回流的现象。

著录项

  • 公开/公告号KR102123275B1

    专利类型

  • 公开/公告日2020-06-16

    原文格式PDF

  • 申请/专利权人 주식회사 에이케이테크;

    申请/专利号KR20190012030

  • 发明设计人 주영병;

    申请日2019-01-30

  • 分类号H01L21/673;

  • 国家 KR

  • 入库时间 2022-08-21 11:04:24

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