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ETCHING SOLUTION MANAGING APPARATUS ETCHING SOLUTION MANAGING METHOD AND CONCENTRATION MEASURING METHOD FOR COMPONENT OF ETCHING SOLUTION
ETCHING SOLUTION MANAGING APPARATUS ETCHING SOLUTION MANAGING METHOD AND CONCENTRATION MEASURING METHOD FOR COMPONENT OF ETCHING SOLUTION
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机译:蚀刻液管理装置蚀刻液成分管理方法及浓度测定方法
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摘要
Provided is an etchant management apparatus, an etchant management method, and a method for measuring the component concentration of an etchant that maintains and manages the performance of the oxalic acid-based etchant as an etchant approximately constant and suppresses precipitation of solid particles. A conductivity meter 17 for measuring the conductivity value of the etchant, and a density meter 18 for measuring the density value of the etchant; It is supplied to the etching solution based on the correlation between the oxalic acid concentration and the conductivity value of the etching solution and the measurement result of the conductivity meter 17, and the correlation between the dissolved metal concentration and density value of the etching solution and the measurement result of the density meter 18. It is equipped with a supplement liquid sending liquid control means for controlling the liquid feeding of the supplement liquid.
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