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METHOD OF PREPARING NANONET TRANSITION METAL DICHALCOGENIDE THIN FILM AND PHOTOTRANSISTOR INCLUDING NANONET TRANSITION METAL DICHALCOGENIDE THIN FILM THEREBY
METHOD OF PREPARING NANONET TRANSITION METAL DICHALCOGENIDE THIN FILM AND PHOTOTRANSISTOR INCLUDING NANONET TRANSITION METAL DICHALCOGENIDE THIN FILM THEREBY
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机译:制备纳米过渡金属二氢噻吩薄膜的方法及包括纳米过渡金属二氢噻吩薄膜的光敏电阻
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摘要
The present application is a step of laminating a transition metal chalcogen compound on a substrate; Laminating a protective layer on the transition metal chalcogen compound; Laminating a block copolymer on the protective layer; The block copolymer is self-assembled to form a circular nanonet structure pattern; Etching the protective layer using the patterned block copolymer as a mask; Etching the transition metal chalcogen compound using the etched protective layer as a mask; And forming a pattern of a hexagonal nanonet structure using a transition metal etchant in the etched transition metal chalcogen compound. It relates to a method of manufacturing a thin film of a nanonet transition metal chalcogen compound.
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