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SILICON CARBIDE: MATERIAL FOR RADIOISOTOPE ENERGY SOURCE

机译:碳化硅:放射性同位素能量源的材料

摘要

FIELD: chemistry.;SUBSTANCE: invention relates to semiconductor structures of silicon carbide. Silicon carbide: material for a radioisotope energy source, which contains a monocrystalline phase of a silicon carbide semiconductor structure in the form of a film having n- and p-type conductivity for separating electron-hole pairs, includes in the silicon carbide molecular structure elements: carbon isotope C12 and additionally C14 for conversion of its radiation energy into electrical energy, wherein concentration of radioisotope C14 in one of layers of n- or p-type conductivity is from 5⋅1017 to 1020 cm-3. Layer of n- or p-type silicon carbide layer can be formed on surface of monocrystalline silicon substrate. Layer of silicon carbide with C14 n- or p-type conductivity has porous surface morphology.;EFFECT: invention provides minimization of radioisotope C14 consumption in the substance of the semiconductor structure, which determines the technical and economic efficiency and radiation safety of the substance application in semiconductor energy conversion devices.;3 cl, 6 ex, 5 dwg
机译:技术领域本发明涉及碳化硅的半导体结构。碳化硅:一种用于放射性同位素能量源的材料,其中包含碳化硅半导体结构的单晶相,该碳化硅半导体结构以薄膜形式存在,该薄膜具有用于分离电子-空穴对的n型和p型导电性,在碳化硅中包含分子结构元素:碳同位素C 12 以及另外的C 14 用于将其辐射能转换为电能,其中放射性同位素C 14 的浓度在一层中n型或p型电导率的范围是5⋅10 17 至10 20 cm -3 。可以在单晶硅衬底的表面上形成n型或p型碳化硅层的层。具有C 14 n型或p型导电性的碳化硅层具有多孔表面形态。效果:本发明使半导体物质中放射性同位素C 14 的消耗最小化结构,决定了该物质在半导体能量转换装置中的应用技术和经济效率以及辐射安全性; 3 cl,6 ex,5 dwg

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