TARGET FOR PHYSICAL GAS PHASE DEPOSITION, NANOCOMPOSITE COATING FILM USING THE SAME, AND MANUFACTURING METHOD FOR IT

摘要

The present invention provides a physical vapor deposition target, the target being formed of a Zr-Cu-Si based alloy to form a low friction coating film, the target being 82-90 atomic% Zr, 4-14 atom -% Cu and 4-8 atom% Si comprises.