The invention relates to a method for preparing a substrate treatment system, in which a reactive gas is brought into a volume (1) of the reactor in at least one conditioning step prior to a substrate treatment process in a process chamber (28), which gas with a component of the ambient air to a surface (7.1, 7.2, 7.3) of the volume (1) adhering solids and a gaseous reaction product reacts. According to the invention, it is proposed that before the reactive gas is fed in, the volume (1) is flooded with ambient air and the reactive gas is fed into the volume after the volume (1) has been evacuated. A hydride or an organometallic compound can be used as the reactive gas.
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