METHOD OF DETERMINING A LEAK

摘要

A method for searching for a leak (210) in a component (200) of a lithography system (100A, 100B), comprising the steps: a) applying pressure (S1) to component (200), b) applying (S2) isopropanol to the component (200), and c) determining (S3) a position of the leak (210) on the basis of bubbles (216) forming in the isopropanol.