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Dual device semiconductor structures with shared drain

机译:具有共享漏极的双器件半导体结构

摘要

Transistors may be manufactured with a shared drain to reduce die area consumed by circuitry. In one example, two transistors can be manufactured that include two body regions that abut a shared drain region. The two transistors can be independently operated by coupling terminals to a source and a gate for each transistor and the shared drain. Characteristics of the two transistors can be controlled by adjusting feature sizes, such as overlap between the gate and the shared drain for a transistor. In particular, two transistors with different voltage requirements can be manufactured using a shared drain structure, which can be useful in amplifier circuitry and in particular Class-D amplifiers.
机译:晶体管可被制造为具有共享的漏极以减小电路消耗的管芯面积。在一实例中,可制造两个晶体管,其包含邻接共享漏极区的两个主体区。通过将端子耦合到每个晶体管的源极和栅极以及共享的漏极,可以独立地操作两个晶体管。可以通过调整特征尺寸来控制两个晶体管的特性,例如,晶体管的栅极和共享漏极之间的重叠。特别地,可以使用共享的漏极结构来制造具有不同电压要求的两个晶体管,这可以用于放大器电路,尤其是D类放大器。

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