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NOUVEAU PROCÉDÉ D'ÉTALONNAGE DE PARAMÈTRE S SUR PUCE

摘要

The present application is applicable to the technical field of terahertz on-wafer measurement, and provides a new on-wafer S-parameter calibration method and device. The method includes: performing two-port calibration on a waveguide end face when a probe is not connected to a test system; performing one-port calibration on each of two probe end faces when the probe is connected to the test system; and fabricating a crosstalk calibration standard equal to a device under test in length on a substrate of the device under test, and correct a crosstalk error of the test system according to the crosstalk calibration standard. The present application can realize accurate characterization and correction of crosstalk error in a high-frequency on-wafer S-parameter calibration process, and improve the accuracy of error correction in high-frequency on-wafer S-parameter measurement.

著录项

  • 公开/公告号EP3686616A1

    专利类型

  • 公开/公告日2020.07.29

    原文格式PDF

  • 申请/专利权人

    申请/专利号EP18925049.1

  • 发明设计人

    申请日2018.12.29

  • 分类号

  • 国家 EP

  • 入库时间 2022-08-21 10:55:46

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