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Review of physical vapour deposition (PVD) techniques for hard coating

机译:回顾用于硬涂层的物理气相沉积(PVD)技术

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摘要

This paper is a review on the status of hard coating of various physical vapour deposition (PVD) techniques and compare their properties. The use of hard and wear resistant PVD coatings on cutting tools is now widespread in global manufacturing for reducing production cost and improving productivity, all of which are essential if industry is to remain economically competitive. The review includes the drawbacks of cathodic arc evaporation (CAE) and conventional magnetron sputtering processes and in this context their improvements. PVD techniques based on sputtering and cathodic arc methods are widely used to deposit hard coating for various cutting tools and many others. From the study, it was concluded that the CAE and radio frequency (RF) magnetron sputtering are the most widely used techniques and appropriate methods for thin film coating. Each technique has its own limitations and process parameters vary with the selection of PVD techniques. These techniques were further modified where uniform and dense coatings with improved adhesion can be achieved without the emission of macrodroplets from plasma streams
机译:本文对各种物理气相沉积(PVD)技术的硬涂层状态进行了综述,并对其性能进行了比较。为了降低生产成本并提高生产率,如今在全球制造业中广泛使用切削工具上的耐磨PVD涂层,这对于保持行业的经济竞争力至关重要。该综述包括阴极电弧蒸发(CAE)和常规磁控溅射工艺的缺点,并在此方面进行了改进。基于溅射和阴极电弧法的PVD技术被广泛用于沉积各种切割工具和许多其他工具的硬涂层。从研究中可以得出结论,CAE和射频(RF)磁控溅射是最广泛使用的技术和合适的薄膜涂层方法。每种技术都有其自身的局限性,工艺参数随PVD技术的选择而变化。对这些技术进行了进一步的修改,从而可以实现均匀而致密的涂层,从而提高附着力,而不会从血浆流中释放出大液滴

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