首页> 外文OA文献 >Photocatalytic Performance of Undoped and Transition-Metal-Doped/Codoped TiO2 Thin Films
【2h】

Photocatalytic Performance of Undoped and Transition-Metal-Doped/Codoped TiO2 Thin Films

机译:未掺杂和过渡金属掺杂/掺杂的TiO2薄膜的光催化性能

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Undoped, single doped and codoped TiO2 thin films were fabricated by spin coating of sol-gel solutions on soda-lime-silica glass substrates followed by annealing at 450°C for 2 h. The mineralogical (GAXRD, Raman spectroscopy), microstructural (SEM, AFM), optical (UV-vis spectroscopy), hydrophilic (wetting angles), crystallographic (TEM) and photocatalytic (dye degradation) properties were determined.Undoped TiO2 thin films with thicknesses of~50-540 nm were fabricated. The films were discontinuous (1 cycle), continuous (4-11 cycles), and damaged (13-15 cycles), with the highest quality films being the continuous ones. The discontinuous and damaged films showed high wetting angles while the continuous films showed low angles. The free energies were the driving force for oxide bond formation and thus the highest contaminant levels were found for Na+ ions that freely diffused through the microstructure until it achieved saturation solubility.Co and V single-doped TiO2 thin films were fabricated with dopant levels of 0.05 to 1.00 mol%. All the films were highly transparent and contained anatase as the sole crystalline phase. At the lowest level (0.05 mol%), the dopant ions were distributed irregularly in the film microstructure and this contributed to defect formation and hindrance of nucleation of the TiO2 crystallites. With increasing dopant levels, the dopants distribution became more homogeneous and this favoured anatase recrystallisation and grain growth. Co formed substitutional solid solutions while V formed interstitial solid solutions in the anatase lattice. The changes in grain and microstructural characteristics of the films were owing to variations in dopant solubilites in the lattice. The data showed that Co has low solubility in TiO2 with the saturation limit being ~0.05 mol%. In contrast, for V doping, the solubility limit was higher, approaching 1.00 mol%.For Co + V codoped TiO2 thin films, substitutional solid solution caused increased anatase recrystallisation at the lowest dopant level. Macroscopic roughening at the highest dopant levels occurred owing to oversaturation, precipitation, and grain boundary pinning. The photocatalytic performance was related to the grain size owing to the associated changes in surface area, number of active sites and partial amorphisation. Intervalence charge transfer effects lowered photoactivity at higher dopant concentrations. Codoping was seen to have a synergistic effect on the photocatalytic performance. Low dopants levels were seen to be ideal for enhancing the photocatalytic performance through modification of the semiconducting properties.
机译:通过在钠钙硅玻璃衬底上旋涂溶胶-凝胶溶液,然后在450°C退火2小时,制得未掺杂,单掺杂和共掺杂的TiO2薄膜。确定了矿物学(GAXRD,拉曼光谱),显微结构(SEM,AFM),光学(UV-可见光谱),亲水(润湿角),晶体学(TEM)和光催化(染料降解)性能。制成约50-540nm的波长。薄膜是不连续的(1个循环),连续的(4-11个循环)和损坏的(13-15个循环),其中质量最高的薄膜是连续的。不连续和损坏的薄膜显示高的润湿角,而连续的薄膜显示低的润湿角。自由能是形成氧化物键的驱动力,因此,Na +离子在微观结构中自由扩散直至达到饱和溶解度的污染物含量最高。制备了掺杂水平为0.05的Co和V单掺杂TiO2薄膜。至1.00摩尔%。所有的膜都是高度透明的,并且包含锐钛矿作为唯一的结晶相。在最低水平(0.05mol%),掺杂剂离子在膜微结构中不规则地分布,这有助于形成缺陷和阻碍TiO 2晶体的成核。随着掺杂物含量的增加,掺杂物分布变得更均匀,这有利于锐钛矿重结晶和晶粒生长。 Co在锐钛矿晶格中形成取代固溶体,而V在锐钛矿晶格中形成填隙固溶体。薄膜的晶粒和微观结构特征的变化是由于晶格中掺杂剂可溶物的变化。数据显示Co在TiO 2中的溶解度低,饱和极限为〜0.05mol%。相比之下,对于V掺杂,溶解度极限更高,接近1.00 mol%。对于Co + V共掺杂的TiO2薄膜,替代固溶体在最低掺杂水平下引起锐钛矿重结晶的增加。由于过饱和,析出和晶界钉扎,在最高掺杂水平下出现了宏观粗糙。由于表面积,活性位点数量和部分非晶化的相关变化,光催化性能与晶粒尺寸有关。间隔电荷转移效应降低了较高掺杂剂浓度下的光活性。共掺杂对光催化性能具有协同作用。低掺杂剂水平被认为是通过改变半导体性能来增强光催化性能的理想选择。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号