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Advanced electroless metallisation of high efficiency laser doped and inkjet printed silicon solar cells

机译:高效激光掺杂和喷墨印刷硅太阳能电池的高级化学镀

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摘要

This thesis investigates the difficulties of metallising grooves created using inkjet printing and laser doping in high efficiency solar cell structures. Poor metallisation of these grooves has been a persistent problem due to the shallowness of the created grooves and, in the case of inkjet printing, the smoothness of the groove surface. In this thesis we select a suitable metallisation technique for plating double sided or interdigitated contact solar cells; identify and understand the current problems faced using this metallisation technique; establish techniques to overcome these limitations; and evaluate the performance of the proposed solutions.The thesis begins with a review of buried contact solar cell structures, laser doping and inkjet printing technologies and the suitability of various wet chemical plating processes. Having identified electroless plating as the most suitable metallisation technique, we continue with an in-depth study of the chemistry behind electroless metal deposition and the effect of different metal solution constituents in the deposition reaction. Experiments in metallising inkjet printed and laser doped grooves find that the metal adhesion of heavily doped phosphorous grooves is the limiting factor in the application of these technologies, and that palladium activation is the cause of this metal-silicon adhesion failure.Electroless plating using nickel boron reducing agent, combined with surface roughening techniques in the case of inkjet printed cells, is investigated as an alternative to palladium activation in both laser doped and inkjet printed cells. We show that excellent adhesion can be achieved using the novel metallisation scheme. An in-depth study identifies the optimal conditions for forming silicide and removing unreacted nickel, therefore improving the adhesion and obtaining negligible contact resistance. We continue by presenting a detailed investigation into the different available contact resistance measurement techniques. The thesis concludes by showing that negligible ohmic contact resistance on both heavily doped phosphorous and boron grooves can be achieved through the use of the proposed novel metallisation scheme.
机译:本文研究了在高效太阳能电池结构中使用喷墨印刷和激光掺杂产生的金属化沟槽的困难。由于所形成的凹槽的浅度以及在喷墨印刷的情况下凹槽表面的光滑度,这些凹槽的金属化差一直是一个长期的问题。在本文中,我们选择一种合适的金属化技术来电镀双面或叉指式接触太阳能电池。识别并了解使用这种金属化技术当前面临的问题;建立克服这些限制的技术;本文首先对埋藏式接触太阳能电池结构,激光掺杂和喷墨印刷技术以及各种湿法化学镀工艺的适用性进行了回顾。在将化学镀确定为最合适的金属化技术之后,我们继续对化学镀金​​属沉积背后的化学性质以及沉积过程中不同金属溶液成分的影响进行深入研究。对喷墨印刷和激光掺杂沟槽进行金属化的实验发现,重掺杂磷沟槽的金属附着力是这些技术应用的限制因素,钯活化是造成这种金属与硅附着力失败的原因。研究了还原剂,结合喷墨印刷电池的表面粗糙化技术,作为激光掺杂和喷墨印刷电池中钯活化的替代方法。我们表明,使用新型金属化方案可以实现出色的附着力。一项深入的研究确定了形成硅化物和去除未反应的镍的最佳条件,从而提高了附着力并获得了可忽略的接触电阻。我们将继续对各种可用的接触电阻测量技术进行详细研究。本文的结论是通过使用提出的新型金属化方案,可以实现在重掺杂磷和硼沟槽上可忽略的欧姆接触电阻。

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