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Facile Fabrication of Ultrafine Hollow Silica and Magnetic Hollow Silica Nanoparticles by a Dual-Templating Approach

机译:通过双模板法轻松制备超细中空二氧化硅和磁性中空二氧化硅纳米粒子

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摘要

The development of synthetic process for hollow silica materials is an issue of considerable topical interest. While a number of chemical routes are available and are extensively used, the diameter of hollow silica often large than 50 nm. Here, we report on a facial route to synthesis ultrafine hollow silica nanoparticles (the diameter of ca. 24 nm) with high surface area by using cetyltrimethylammmonium bromide (CTAB) and sodium bis(2-ethylhexyl) sulfosuccinate (AOT) as co-templates and subsequent annealing treatment. When the hollow magnetite nanoparticles were introduced into the reaction, the ultrafine magnetic hollow silica nanoparticles with the diameter of ca. 32 nm were obtained correspondingly. Transmission electron microscopy studies confirm that the nanoparticles are composed of amorphous silica and that the majority of them are hollow.
机译:中空二氧化硅材料的合成方法的发展是一个备受关注的问题。尽管有许多化学路线可供使用并被广泛使用,但中空二氧化硅的直径通常大于50 nm。在这里,我们报告了一条以十六烷基三甲基溴化铵(CTAB)和双(2-乙基己基)磺基琥珀酸钠(AOT)为模板合成具有高表面积的超细中空二氧化硅纳米粒子(直径约24 nm)的途径。以及随后的退火处理。当将空心磁铁矿纳米颗粒引入反应中时,直径为约3μm的超细磁性空心二氧化硅纳米颗粒。相应地获得32nm。透射电子显微镜研究证实纳米颗粒由无定形二氧化硅组成,并且它们中的大多数是中空的。

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