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Scanning Tunneling Microscopy Studies of Metal Clusters Supported on Graphene and Silica Thin Film

机译:石墨烯和二氧化硅薄膜上支撑的金属团簇的扫描隧道显微镜研究

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摘要

The understanding of nucleation and growth of metals on a planar support at the atomic level is critical for both surface science research and heterogeneous catalysis studies. In this dissertation, two planar substrates, including graphene and ultra-thin silica film were employed for supported model catalysts studies. The structure and stability of several catalytically important metals supported on these two substrates were thoroughly investigated using scanning tunneling microscopy (STM) coupled with other traditional surface science techniques.In the study of the graphene/Ru(0001) system, the key factors that govern the growth and distribution of metals on the graphene have been studied based on different behaviors of five transition metals, namely Pt, Rh, Pd, Co, and Au supported on the template of a graphene moire pattern formed on Ru(0001). Both metal-carbon (M-C) bond strength and metal cohesive energies play significant roles in the cluster formation process and the M-C bond strength is the most important factor that affects the morphology of clusters at the initial stages of growth. Interestingly, Au exhibits two-dimensional (2-D) structures that span several moire unit cells. Preliminary data obtained by dosing molecular oxygen onto CO pre-covered Au islands suggest that the 2-D Au islands catalyze the oxidation of CO. Moreover, graphene/Ru(0001) system was modified by introducing transition metals, oxygen or carbon at the interface between the graphene and Ru(0001). Our STM results reveal that the geometric and/or electronic structure of graphene can be adjusted correspondingly.In the study of the silica thin film system, the structure of silica was carefully investigated and our STM images favor for the [SiO4] cluster model rather than the network structure. The nucleation and adsorption of three metals, namely Rh, Pt and Pd show that the bond strength between the metal atom and Si is the key factor that determines the nucleation sites at the initial stages of metal deposition. The annealing effect studies reveal that Rh and Pt atoms diffuse beneath the silica film and form the 2-D islands that are covered with a silica thin film. In contrast, the formation of Pd silicide was observed upon annealing to high temperatures.
机译:对于表面科学研究和非均相催化研究而言,对原子在平面载体上的金属成核和生长的理解至关重要。本论文采用石墨烯和超薄二氧化硅膜这两种平面载体对负载型催化剂进行了研究。使用扫描隧道显微镜(STM)结合其他传统表面科学技术,彻底研究了负载在这两种基材上的几种具有催化作用的重要金属的结构和稳定性。在石墨烯/ Ru(0001)体系的研究中,决定石墨烯/ Ru(0001)体系的关键因素基于五种过渡金属(Pt,Rh,Pd,Co和Au负载在Ru(0001)上形成的石墨烯莫尔图案的模板上)的不同行为,研究了金属在石墨烯上的生长和分布。金属-碳(M-C)键强度和金属内聚能在簇形成过程中均起着重要作用,而M-C键强度是在生长初期影响簇形态的最重要因素。有趣的是,Au表现出跨几个莫尔单元的二维(2-D)结构。通过将分子氧分配到CO预先覆盖的Au岛上获得的初步数据表明,二维Au岛可催化CO的氧化。此外,通过在界面处引入过渡金属,氧或碳来修饰石墨烯/ Ru(0001)系统介于石墨烯和Ru(0001)之间。我们的STM结果表明,可以相应地调节石墨烯的几何和/或电子结构。在二氧化硅薄膜系统的研究中,仔细研究了二氧化硅的结构,我们的STM图像更适合[SiO4]团簇模型,而不是网络结构。 Rh,Pt和Pd这三种金属的成核和吸附表明,金属原子与Si之间的键合强度是决定金属沉积初期成核位置的关键因素。退火效应研究表明,Rh和Pt原子在二氧化硅膜下方扩散,并形成被二氧化硅薄膜覆盖的2-D岛。相反,在退火至高温时观察到Pd硅化物的形成。

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    Zhou Zihao;

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  • 年度 2012
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