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Tetraphosphine Linker Scaffolds with a Tetraphenyltin Core for Superior Immobilized Catalysts: A Solid-State NMR Study

机译:具有四苯基锡核的四膦连接基支架,用于高级固定化催化剂:固态NMR研究

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摘要

The focus of this work is to synthesize and immobilize novel rigid tetraphosphine linkers via the formation of phosphonium groups and by direct adsorption of tetraphosphine salts on oxide surfaces. These methods offer the possibility to study the mechanism of the phosphonium formation in more detail by utilizing solid-state NMR spectroscopy. It has also been a point of interest to study the linkers and catalysts under realistic conditions, in the presence of solvents. Therefore, HRMAS (high-resolution magic angle spinning) NMR spectra of several phosphonium salts, adsorbed on SiO2, have been studied. This technique allows one to probe the leaching and mobility of the linkers on the surface. The mobilities of the linkers and the catalysts are crucial factors for the performance and design of the immobilized catalysts. Finally, since the exact mode of binding to the surface is unknown and is being discussed in the literature, for example, as hydrogen bonding between the F atoms in BF4- and surface silanol protons, the influence of the counteranion on the binding of phosphonium salts on silica surfaces is of utmost interest. For surface mobility studies a monolayer of phosphonium salts on the silica surface, both without solvent and in the presence of solvent, has been studied via 31P and 2H CP/MAS and HRMAS. Our findings show that the integrity of the tetraphosphine scaffold linkers is based upon how it is immobilized. The best system is formed when the phosphine is immobilized on the SiO2 support by adding Cl(CH2)3Si(OEt)3 to the reaction mixture. In this way, phosphonium salts are obtained, which are bound to the surface irreversibly by electrostatic interactions, as proven by solid-state NMR. In addition, leaching and mobility studies prove that the solvents play a crucial role, and the more polar solvents, such as DMSO, lead to the most extensive leaching due to the solvents' strong adsorption on the SiO2 surface. Leaching studies also show that the counteranion has an influence on the binding of the phosphoniumn salts on the SiO2 surface. The leaching proceeds in the following manner: BF4- > I- > Br- > Cl-. This is an indication that there is an additional interaction between the anion and, most probably, the surface silanol protons.
机译:这项工作的重点是通过形成groups基团以及通过将四膦盐直接吸附在氧化物表面上来合成和固定新型刚性四膦连接基。这些方法提供了利用固态NMR光谱更详细地研究the形成机理的可能性。在溶剂存在下,在实际条件下研究连接基和催化剂也是一个有趣的问题。因此,已经研究了几种吸附在SiO2上的phospho盐的HRMAS(高分辨率魔术角旋转)NMR光谱。该技术使人们能够探测表面上接头的浸出和迁移。接头和催化剂的迁移率是固定化催化剂的性能和设计的关键因素。最后,由于与表面结合的确切方式尚不清楚,并且正在文献中进行讨论,例如,由于BF4-中F原子与表面硅烷醇质子之间的氢键结合,抗衡阴离子对phospho盐结合的影响在二氧化硅表面上的涂料是最重要的。对于表面迁移率研究,已经通过31P和2H CP / MAS和HRMAS研究了无溶剂和有溶剂存在下的二氧化硅表面上的salts盐单层。我们的发现表明,四膦骨架连接子的完整性取决于其固定方式。当通过将Cl(CH2)3Si(OEt)3添加到反应混合物中来将膦固定在SiO2载体上时,形成最佳体系。以此方式,获得了salts盐,其通过静电相互作用不可逆地结合到表面,如通过固态NMR所证明的。此外,浸出和迁移率研究证明溶剂起着至关重要的作用,极性更大的溶剂(例如DMSO)由于溶剂在SiO2表面上的强烈吸附而导致最广泛的浸出。浸出研究还表明,抗衡阴离子对the盐在SiO2表面的结合有影响。浸出按以下方式进行:BF 4-> I-> Br-> Cl-。这表明阴离子与最有可能的表面硅烷醇质子之间存在其他相互作用。

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    Perera Melanie Ingrid;

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  • 年度 2011
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