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Deposition of Hard Chrome Coating onto Heat Susceptible Substrates by Low Power Microwave Plasma Spray

机译:低功率微波等离子喷涂在热敏基体上沉积硬铬涂层

摘要

Microwave plasma spray requires relatively low power, which is lower than 1 kW in comparison to other plasma spraying method. Until now, we are able to deposit Cu and Hydroxyapatite coating onto heat susceptible substrate, CFRP which are difficult for conventional plasma spray due to the excessive heat input. In this paper, a hard chromium coating was deposited onto SUS304 and CFRP by a low power microwave plasma spray technique. By controlling the working gas flow rate and spraying distance, a hard chrome coating with thickness of approximately 30 μm was successfully deposited onto CFRP substrate with hardness of 1110 Hv0.05. Furthermore, the coating produced here is higher than that produced by hard chrome plating.
机译:微波等离子体喷涂需要相对较低的功率,与其他等离子体喷涂方法相比,该功率低于1 kW。到目前为止,我们已经能够将铜和羟基磷灰石涂层沉积到热敏性基材CFRP上,由于过多的热量输入,传统的等离子喷涂很难做到这一点。在本文中,通过低功率微波等离子体喷涂技术在SUS304和CFRP上沉积了一层硬铬涂层。通过控制工作气体流速和喷涂距离,可以在CFRP基材上成功沉积厚度约为30μm的硬铬涂层,其硬度为1110 Hv0.05。此外,这里生产的涂层要比硬铬电镀的涂层高。

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