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Schottky Barrier and Surface Plasmonic Resonance Phenomena Towards the Photocatalytic Reaction: Study of Their Mechanisms to Enhance Photocatalytic Activity

机译:肖特基势垒和表面等离子体共振现象对光催化反应的影响:增强光催化活性的机理研究

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摘要

Metals are doped on semiconductors to enhance the activity of photocatalysts and two possible phenomena can happen at the interfaces of the semiconductors: Schottky barrier formation and Surface Plasmonic Resonance (SPR). Schottky barriers can improve the photoactivity of a reaction by trapping and prolonging the life of the electron. While SPR has the ability to create an electromagnetic field which can improve the photoreaction in three ways: photon scattering, Plasmon Resonance Energy Transfer (PRET) and hot electron excitation. Although both phenomena have been well grounded throughout the field, one crucial ambiguity is still found based on the proposed mechanisms, specifically, what is the direction of electron flow – from metal to semiconductor or vice versa? This feature article reviews the mechanism focusing on how Schottky barrier and SPR phenomena help to improve a photoreaction, as well as the paradox between the Schottky barrier and SPR in the matter of the direction of electron flow in the metal/semiconductor system.
机译:金属掺杂在半导体上以增强光催化剂的活性,并且在半导体的界面处可能发生两种可能的现象:肖特基势垒形成和表面等离子体共振(SPR)。肖特基势垒可以通过俘获并延长电子的寿命来提高反应的光活性。 SPR具有创建电磁场的能力,可以通过三种方式改善光反应:光子散射,等离子体共振能量转移(PRET)和热电子激发。尽管这两种现象在整个领域都已充分扎根,但根据所提出的机制仍发现一个关键的歧义,具体来说,电子从金属到半导体的流动方向是什么?反之亦然?这篇专题文章回顾了机制,重点关注肖特基势垒和SPR现象如何帮助改善光反应,以及在金属/半导体系统中电子流向方面,肖特基势垒和SPR之间的悖论。

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