Demonstration of Resistive Heating Treatment of DNAPL Source Zone at Launch Complex 34 in Cape Canaveral Air Force Station, Florida

摘要

Dense, nonaqueous-phase liquid (DNAPL) contaminants are a challenge to characterize and remediate at many sites where such contaminants have entered the aquifer due to past use or disposal practices. Chlorinated solvents, comprised of chlorinated volatile organic compounds (CVOCs), such as trichloroethylene (TCE) and perchloroethylene (PCE), are common DNAPL contaminants at sites where operations, such as aircraft maintenance, dry cleaning, metal finishing, and electronics manufacturing have historically occurred. In the past, because of the difficulty in identifying the DNAPL source zone, most remediation efforts focused on controlling the migration of the dissolved CVOC plume. In recent years, many site owners have had success in locating DNAPL sources. DNAPL source remediation is beneficial because once the source has been significantly mitigated, the strength and duration of the resulting plume can potentially be lowered in the long term, and sometimes in the short term as well.