Design, operating theory, and performance characteristics of a newly developed variable reluctance differential pressure transducer, the wafer gage, are described. This transducer was designed for use primarily in the arc-heated, Hotshot type, hyper-velocity wind tunnels at the Arnold Engineering Development Center. The wafer gage provides a series of pressure ranges from 0-0. 5 to 0-5. 0 psid by means of interchangeable diaphragms. Although 0-0. 5 psid is the lowest range specified for the wafer gage, it is frequently calibrated for full scale output at 0. 01 psid, and pres¬sure differentials of 30 microns of mercury can be resolved. Because of the convenient wafer shape and the miniature size of this transducer, it may be used in many applications where larger transducers are not feasible.
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